In Situ Process Monitoring

Plasma Etch

PlasmaTemp
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 altProduct Description
The PlasmaTemp SensorWafer offers in-situ temperature monitoring of plasma etch chambers. Its proprietary sensor technology accurately characterizes the actual production wafer thermal processes. As SensorWafers are built on production grade silicon wafers, standard wafer-handling track robotics easily deploy them without any equipment modifications or production downtime. Customers can now achieve the next level of control of the critical etch process zone.

PlasmaTemp SensorWafers are the industry’s first wireless etch process zone control product. The onboard electronics module stores process run data and uploads it via infrared to the communications port in the FOUP, Laptop, or Handheld. Thus, it is a self-contained system not requiring tethers to the host. The PlasmaTemp SensorWafer is available in our 3rd generation format for 150-300mm applications, and in our latest 4th generation design with improved sensor accuracy and longer wafer life for 300mm.
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Sensor network isolated using a high purity polyimide coating

 

 

Hardened “System on a Wafer” electronics module for high speed, autonomous data acquisition & wireless data transfer

Base material is SEMI standard wafer with thermal oxide layer

3rd Generation
PlasmaTemp SensorWafer (300mm)
 
Wireless Operation
Wireless Operation
InfraRed communication
 
SensorWafer in SmartFOUP
Inductive Charging
Related Information
PlasmaTemp Product Overview