LOOK INSIDE YOUR PROCESS

SensArray™ measurements for superior process control

SensArray’s instrumented substrates provide a unique way to capture the effect of the process environment on production wafers. SensArray's SensorWafers™ provide wafer-level spatial resolution not available from conventional equipment monitors. SensorWafer measurements, such as temperature and RF voltage, are used by both chipmakers and process equipment manufacturers to visualize, diagnose, and control their processes and process tools. They are tailored to meet the unique operating range and accuracy requirements of each target application.

The PlasmaVolt X2 is the next in the PlasmaVolt SensorWafer Series designed to measure and characterize plasma behavior in semiconductor plasma-based wafer processing systems. It replaces the pioneering PlasmaVolt product by doubling the number of sensors which are placed in an optimal layout to maximize wafer-level spatial information. The PlasmaVolt X2 can be deployed into the chamber just like any product wafer, and collects spatially resolved information about critical plasma parameters through embedded V_RF sensors. The array of patented V_RF sensors is able to detect the critical parameters of most concern by etch technologists today.

Featured Product

PlasmaVolt X2 SensorWafer

Announcements

KLA-Tencor Launches PlasmaVolt X2 to Measure Plasma Chamber Effects (10/14/08)

KLA-Tencor gets the noise out with latest plasma monitor