Because we never want our customers to be simply satisfied, SensArray in always working to innovate improvements to our offerings and revolutionize the area of process optimization, whether it’s through the development of new technologies, techniques, or processes.

Here’s a sneak peek at the process optimizations tools coming up next from SensArray. More details will follow when this product is released.

OP-T-MAP Software with TrackTUNE™– currently in beta development stage
The newest process optimization software package from SensArray offers the ability to tune your advanced lithography track to the highest uniformity available. After acquiring zone temperature, controller power, and wafer temperature using the Integrated Wafer, the software designs an ideal control model of your plate, and computes offsets for you to enter back into your litho track.