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LPCVD/SACVD Cold Wall

 

Process Probe 1530 Process Probe 2140

Process Probe 1530 (0°C to 130°C)

  • Measure wafer and chuck delta T with plasma off
  • Measure temperature uniformity with plasma off
  • Measure temperatures with gas flows and plasma off

Process Probe 2140 (-60°C to 420°C)

  • Measure temperatures during plasma deposition

 

Other Processes Supported
1530 PVD
  MCVD/MOCVD
  EPI
  PECVD
  LPCVD/SACVD
  SOD
2140 APE
  LPCVD/SACVD
  PECVD
  PS w/BP
  PVD