Solution
LPCVD/SACVD Cold Wall
Process Probe 1530
(0°C to 130°C)
Measure wafer and chuck delta T with plasma off
Measure temperature uniformity with plasma off
Measure temperatures with gas flows and plasma off
Process Probe 2140
(-60°C to 420°C)
Measure temperatures during plasma deposition
Other Processes Supported
1530
PVD
MCVD/MOCVD
EPI
PECVD
LPCVD/SACVD
SOD
2140
APE
LPCVD/SACVD
PECVD
PS w/BP
PVD